Nanofabrication by Ion-Beam Sputtering

"This volume provides a remarkable overview of the status of the evolving field of ion-beam sputtering and its promising applications as a process tool for tailoring self-organized patterned properties and periodic nanoscale topographic features of surfaces. The topical scope includes the fundamental physics of sputtering, advanced simulations of pattern formation, and selected experimental applications.   The list of authors includes distinguished authorities in this field, and the book will surely become a highly cited reference source, as future manufacturing technologies develop."

~Dr. J. E. E. Baglin, IBM Almaden Research Center, USA

"Since the inception of nanotechnology in the 1970s, low-energy ion-beam sputtering of solids has been expected to rank among the top routes to nanostructures fabrication. In spite of the development that this technique has since undergone, to date a thorough revision is under way on the basic mechanisms controlling the pattern formation process, key to a full control of its practical implications. This book provides a broad and timely view of the topic through contributions by world-class specialists, from atomistic principles and discrete theoretical modeling to experiments and technological applications. It will be invaluable for both practitioners in the field and anyone interested in nanoscience, to assess the degree to which current developments enable the harnessing of the technique that is up to the well-founded expectations."

~Prof. Rodolfo Cuerno, Universidad Carlos III de Madrid, Spain

"Bombarding a solid surface with a broad ion beam can produce a remarkable variety of self-assembled nanoscale patterns, including periodic height modulations or “ripples” and mounds arranged in hexagonal arrays of astonishing regularity. This book gives a comprehensive overview of our current understanding of these intriguing phenomena. Written by leaders in the field, it covers both theoretical and experimental work, and the topics range from the fundamental to the applied.  This volume will be an invaluable reference for both researchers in the field and those who are new to the topic."

~Prof. R. Mark Bradley, Colorado State University, USA