This might be the first book that deals mostly with the 3D technology computer-aided design (TCAD) simulations of stress- and strain-engineered advanced semiconductor devices. The book focuses on how to set up 3D TCAD simulation tools, from mask layout to process and device simulation, including design for manufacturing (DFM), and from device modeling to SPICE parameter extraction.
This book offers an innovative and new approach toward the teaching of the fundamentals of semiconductor process and device design using advanced TCAD simulations of various semiconductor structures. The simulation examples chosen are from the most popular devices in use today and provide useful technology and device physics insights. To extend the role of TCAD in today’s advanced technology era, process compact modeling (PCM) and DFM issues have been included for design–technology interface generation.
Unique in approach, this book provides an integrated view of silicon technology and beyond—with emphasis on TCAD simulation. It describes not only the manufacturing practice associated with the technologies used but also the underlying scientific basis for those technologies. Written from an engineering standpoint, this book provides the process design and simulation background needed to understand new and future technology development, process modeling, and design of nanoscale transistors.
The aim of this book is to advance the understanding and knowledge of modern IC design via TCAD, improve the quality in micro- and nanoelectronics research and development, and support the training of semiconductor specialists. This book is intended as a text or reference for graduate students in the field of semiconductor fabrication. Major state-of-the-art devices (both stress- and strain-engineered) and their design are described and illustrated with 3D simulations.
This book is intended as a reference for engineers involved in VLSI technology development who have to solve device and process problems. CAD specialists will find this book useful since it discusses the organization of the simulation system and also presents many case studies where the user applies TCAD tools in different situations.
