Zhiyong Ma
Zhiyong Ma received his MS degree in materials engineering from Purdue University, Indiana, and a PhD in materials science and engineering from the University of Illinois, Urbana-Champaign. He worked in thin-film metallization and processing at Digital Equipment Corporation and joined Intel’s Corporate Quality Network in 1995. Currently, he is vice president of the Technology and Manufacturing Group and
director of Technology Development and Manufacturing Labs at Intel, responsible for the CQN lab network in support of silicon and assembly technology development and manufacturing, product fault diagnostics, and silicon and platform benchmarking, including strategic business
planning, analytical technique development, and metrology roadmaps. Dr. Ma holds 8 patents in underbump metallization, strained silicon transistors, secured fuse technology, and silicon diagnostic techniques, has published more than 25 refereed papers, and has coauthored a book chapter
on silicide technology. His research interests include thin-film kinetics, analytical techniques and metrology, and product fault diagnostics.