This is the first-ever book on the preparation, atomic-level description, and chemistry of ultrathin silica films grown on metal substrates. Silica (SiO2) is one of the key materials in many modern technological applications. Further miniaturization of nanoelectronic devices necessitates the rational design of ultrathin silica films on electrically conductive substrates. A growing body of experimental and theoretical results provide the basis for placing single-layer silicates into the family of truly two-dimensional materials and receiving the name silicatene. In addition, thin silica films are well suited for studying chemical reactions on silica surfaces. Moreover, using thin silica films modified with other metals, one can address the surface structures and chemistry of natural silicates, such as clays and zeolites. Finally, studies on well-defined silica films may provide an atomic-level description of crystal–glass transitions.
- The first-ever book summarizing up-to-date available information on the atomic structures of ultrathin silica films
- Highlights the critical role of the interplay between experiment and theory
- Discusses a field that is related both to material sciences and surface chemistry disciplines
- Addresses advanced researchers as well as beginners